HiPace® 2800 IT with TC 1200, DN 250 ISO-F

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  • Ideal for ion implantation systems
  • Optimized pumping speed for light gases
  • The nickel-plated rotor guarantees resistivity to the dopants used
  • The intelligent temperature management system reduces process condensation and deposits
  • Semi S2 and UL/CSA certification

  • Ideal for ion implantation systems
  • Optimized pumping speed for light gases
  • The nickel-plated rotor guarantees resistivity to the dopants used
  • The intelligent temperature management system reduces process condensation and deposits
  • Semi S2 and UL/CSA certification