Ideal for ion implantation systems, Optimized pumping speed for light gases, The nickel-plated rotor guarantees resistivity to the dopants used, The intelligent temperature management system reduces process condensation and deposits, Semi S2 and UL/CSA certification
Rugged, powerful turbopump with a pumping speed of up to 260 l/s for N2, For external TCP 350 drive electronics, Ideal for applications that require separate installation of pump and drive, For installation in any orientation, Extensive accessories expand the range of applications
Rugged, powerful turbopump with a pumping speed of up to 260 l/s for N2, For external TCP 350 drive electronics, For installation in any orientation, Ideal for applications that require separate installation of pump and drive, Extensive accessories expand the range of applications
Rugged, powerful turbopump with a pumping speed of up to 260 l/s for N2, Extremely high compression, especially for light gases. Ideal for the generation of an ultra high vacuum, External TCP 350 drive electronics, For installation in any orientation, Extensive accessories expand the range of applications
Rugged, powerful turbopump with a pumping speed of up to 260 l/s for N2, Extremely high compression, especially for light gases. Ideal for the generation of an ultra high vacuum, TC 110 integrated electronic drive unit, For installation in any orientation, Extensive accessories expand the range of applications
Don't worry we won't leave you in a vacuum
